Manual Semiconductor Metrology System
Cost-effective alternative to full-automated wafer measurement and inspection systems
Product can provide measurement of thickness and bow of all wafer materials including Silicon, Gallium-Arsenide, Indium-Phosphide and sapphire or tape
- Front USB port enables easy storage of measurements and other data to flash drives
- MTI Instruments’ Proprietary Capacitance Circuitry for Outstanding Accuracy and Dependability
- Non-contact measurements
- 76-300 mm diameter wafer range
- Optional wafer measurement rings
- Wafer stops for exact centering
- Ethernet interface
- Full remote control software (Windows compatible)
- Optional calibration wafers
|Product Info||Technical Specifications|
|P/N||Model||Measurement Range||Accuracy||Resolution||Interface||Type||Frequency Response||Request Info|
|8000-6760-001||Proforma 300i||1700µm (66.9mil/s)||±0.25 µm||0.05µm||RS232 and Ethernet||Desktop System||16.6Hz||Request Infomation on Proforma 300i|
|8000-6760-002||Proforma 300Gi||1700µm (66.9mil/s)||±0.25 µm||0.05µm||RS232 and Ethernet||Desktop System||16.6Hz||Request Infomation on Proforma 300Gi|
|Not finding what you’re looking for? MTI offers custom solutions More Info About MTI’s Custom Solutions|
|Semiconductor||Thickness||GaAs substrate thickness measurement|
|Semiconductor||Surface||Wafer Thickness, Bow, Warp and TTV|
|Semiconductor||Surface||Wafer QA/QC after slicing and polishing|
Manual Semiconductor Wafer Measurement: Accurately measure 76 mm to 300 mm semiconductor wafer for TTV, thickness and bow. Cost effective manual metrology system – Watch Now
Tutorial – Using the Proforma 300i: Perform bow, thickness and TTV measurement – Watch Now
The Proforma 300i wafer thickness gauge is a capacitance based, differential measurement system that performs non-contact thickness measurements of semiconducting and semi-insulating wafers. By utilizing MTI Push/Pull technology, the Proforma 300i does not require the wafers to have a consistent electrical ground resulting in exceptional accuracy and repeatability for most wafer types. The Proforma 300i system includes full remote control operating software and Ethernet network interface capability.
*Gallium-Arsenide requires probe reconfiguration for semi-insulating materials over 10K-Ohm cm bulk resistance.
|8000-6563||Base Rings||50.8mm (2″) Base rings are required for BOW measurements|
|8000-6552||Base Rings||76.2mm (3″) Base rings are required for BOW measurements|
|8000-6548||Base Rings||100mm (4″) Base rings are required for BOW measurements|
|8000-6553||Base Rings||125mm (5″) Base rings are required for BOW measurements|
|8000-6564||Base Rings||152.4mm (6″) Base rings are required for BOW measurements|
|8000-6565||Base Rings||203.25mm (8″) Base rings are required for BOW measurements|
|2000-2000||Calibration Standard||Silicon (Si) wafer|
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